Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1978-10-05
1980-04-08
Louie, Jr., Won H.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
260326N, 260349, 430286, 430283, G03C 168, G03C 152
Patent
active
041971337
ABSTRACT:
The compositons of matter according to the invention consist of at least one polymeric compound and at least one compound of the formula I ##STR1## in which R is a divalent organic radical. The weight ratio of polymer to compound of the formula I is about 9:1 to 1:4.
The compounds of the formula I and thus also the compositions of matter are photo-curable (-crosslinkable). They are superior to known systems in respect of heat stability and oxidation resistance, while possessing photosensitivity which is equally as good.
REFERENCES:
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patent: 2940853 (1960-06-01), Sagura et al.
patent: 3287128 (1966-11-01), Lugasch
patent: 3749713 (1973-07-01), Clecak et al.
patent: 3812162 (1974-05-01), Clecak et al.
patent: 3856531 (1974-12-01), Grisdale et al.
patent: 4092345 (1978-05-01), Wolford et al.
Kvita Vratislav
Zweifel Hans
Ciba-Geigy Corporation
Hall Luther A. R.
Louie, Jr. Won H.
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