Photo-chemical vapor deposition apparatus having exchange appara

Details Photo-chemical vapor deposition apparatus having exchange appara Photo-chemical vapor deposition apparatus having exchange appara

1996-03-11

1998-09-22

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118722, 414221, C23C 1600

Patent

active

058109307

ABSTRACT:
A photo-chemical vapor deposition ("photo-CVD") apparatus has exchange apparatus of optical window and method of exchanging optical window therewith. There photo-CVD apparatus has exchange apparatus of optical window which can replace an optical window blurred by attachment of materials produced by dissociation of reaction gas or materials used for disposition in a reaction chamber of a photo-CVD apparatus during photo-CVD reaction with a clean optical window without exposing the inside of the reaction chamber to the air and to the method of exchanging optical window of the photo-CVD apparatus using the exchange apparatus of optical window.

REFERENCES:
patent: 4836140 (1989-06-01), Koji

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