Liquid purification or separation – Processes – Utilizing electrical or wave energy directly applied to...
Reexamination Certificate
2005-07-12
2005-07-12
Lawrence, Frank M. (Department: 1724)
Liquid purification or separation
Processes
Utilizing electrical or wave energy directly applied to...
C210S763000, C210S768000, C210S912000, C156S345130
Reexamination Certificate
active
06916428
ABSTRACT:
A photo-chemical remediation of Cu-CMP waste streams basically includes the following acts: adding photo-catalyst particles into waste streams containing copper ions and organic pollutants and exposing the waste streams to UV light or sunlight to make copper ions become deposited on surfaces of the photo-catalyst particles. Whereby, the copper ions are removed from the waste streams. Meanwhile, organic and inorganic pollutants are decomposed by the photolysis capability of the photo-catalyst to make the waste streams dischargable within environmental standards to the environment.
REFERENCES:
patent: 5501801 (1996-03-01), Zhang et al.
patent: 6183351 (2001-02-01), Aoki
patent: 6238571 (2001-05-01), Olmez et al.
patent: 6398964 (2002-06-01), Brady et al.
patent: 6464951 (2002-10-01), Kittrell et al.
patent: 6585863 (2003-07-01), Davydov et al.
patent: 2001/0052500 (2001-12-01), Sun et al.
patent: 2004/0065621 (2004-04-01), Sha et al.
patent: 2002-263990 (2002-09-01), None
Gao Ning
Keleher Jason
Li Yuzhuo
Amia Corporation
Kamrath Alan D.
Lawrence Frank M.
Nikolai & Mersereau , P.A.
Persee Chemical Co. Ltd.
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