Coating apparatus – Gas or vapor deposition – With treating means
Patent
1988-07-05
1990-01-23
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118719, 118729, 156345, 427 541, C23C 1600
Patent
active
048951072
ABSTRACT:
A photo chemical reaction apparatus comprises a vacuum container partitioned into a reaction chamber and a carrier chamber by use of partition board. The partition board has an opening into which a carrier tray can be detachably inserted so as to cause the rection chamber to be hermetically sealed. The carrier tray has a substrate holder opposite to a light-penetrating window. A reaction gas flows between this window and a substrate to be processed mounted on the substrate holder.
REFERENCES:
patent: 4042128 (1977-08-01), Shrader
patent: 4047624 (1977-09-01), Dorenbos
patent: 4274936 (1981-06-01), Love
patent: 4313254 (1982-02-01), Feldman et al.
patent: 4654226 (1987-03-01), Jackson et al.
patent: 4781511 (1988-11-01), Harada et al.
Furukawa Akihiko
Iida Yoshinori
Miyagawa Ryohei
Yano Kensaku
Bueker Richard
Kabushiki Kaisha Toshiba
Owens Terry J.
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