Photo-cathode image projection apparatus for patterning a semico

Details Photo-cathode image projection apparatus for patterning a semico Photo-cathode image projection apparatus for patterning a semico

1989-03-23

1991-06-11

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37317

Patent

active

050234625

ABSTRACT:
A photo-cathode image projection apparatus includes a light source for producing an optical beam, a photoelectron mask disposed so as to be irradiated by the optical beam and a photoelectron mask patterned according to a desired pattern with a material that emits photoelectrons in response to irradiation by an optical beam. The apparatus also includes a focusing device for focusing the emitted photoelectrons to form a photoelectron beam focused on the object, an acceleration electrode disposed along the path of the photoelectron beam for accelerating the photoelectrons in the beam, an elongated passage defined in the acceleration electrode to permit passage of a part of the photoelectron beam, and a stage disposed for supporting the object in a position such that the focused photoelectron beam is focused on the object. Also included is a voltage source for applying an acceleration voltage between the photoelectron mask and the acceleration electrode. The acceleration electrode is held at an electrical potential level that is identical to the electrical potential level of the stage, so that the object supported on the stage is electrically shielded from the photoelectron mask by the acceleration electrode.

REFERENCES:
patent: 4460831 (1984-07-01), Oettinger et al.
patent: 4695732 (1987-09-01), Ward
patent: 4705956 (1987-11-01), Ward
patent: 4789786 (1988-12-01), Yasuda et al.

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