Photo-assisted remote plasma apparatus and method

Details Photo-assisted remote plasma apparatus and method Photo-assisted remote plasma apparatus and method

1998-08-20

2000-08-01

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118723ER, 118723IR, 156345, C23C 1600

Patent

active

060950854

ABSTRACT:
The present invention provides a plasma processing system comprising a remote plasma activation region for formation of active gas species, a transparent transfer tube coupled between the remote activation region and a semiconductor processing chamber, and a source of photo energy for maintaining activation of the active species during transfer from the remote plasma activation region to the processing chamber. The source of photo energy preferably includes an array of UV lamps. Additional UV lamps may also be used to further sustain active species and assist plasma processes by providing additional in-situ energy through a transparent window of the processing chamber.

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patent: 5753886 (1998-05-01), Iwamura

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