Photo-assisted CVD apparatus

Details Photo-assisted CVD apparatus Photo-assisted CVD apparatus

1995-05-22

1996-06-18

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723R, 118723MP, 118723E, C23F 102

Patent

active

055274170

ABSTRACT:
A photo-assisted CVD apparatus including a reaction chamber for storing a substrate, an inlet port for feeding a source gas into the reaction chamber, a light source for radiating light on the source gas fed into the reaction chamber to decompose the source gas upon radiating the light, thereby depositing a film on the substrate, an inlet port for supplying an etching gas into the reaction chamber, and a discharge electrode, arranged above the substrate and having a configuration, surrounding a space above the substrate, for exciting the etching gas.

REFERENCES:
patent: 4811684 (1989-03-01), Tashiro
patent: 4816294 (1989-03-01), Tsuo
patent: 4918028 (1990-04-01), Shirai
patent: 4974542 (1990-12-01), Hayashi
patent: 5074456 (1991-12-01), Degner
patent: 5183511 (1993-02-01), Yamazaki
patent: 5215588 (1993-06-01), Rhieu
patent: 5223039 (1993-06-01), Suzuki

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