Photo-assisted chemical vapor deposition method

Details Photo-assisted chemical vapor deposition method Photo-assisted chemical vapor deposition method

1993-05-25

1994-11-15

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Photoinitiated chemical vapor deposition

427583, 427584, 118715, 118722, B05D 306, C23C 1648

Patent

active

053646673

ABSTRACT:
In a photo-CVD system, ultraviolet light is introduced into a reaction chamber from light emitting elements of ultraviolet light sources, through transparent bulb surfaces thereof, and through elongated light pipes in a sealed wall bounding the reaction chamber. This prevents molecules of reactant gas in the reaction chamber from reaching and being deposited on the transparent bulb surfaces, and thereby prevents buildup of such reactant molecules from occurring and impeding flow of ultraviolet light into the reaction chamber.

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