Photo and radiation-sensitive organopolymeric material

Details Photo and radiation-sensitive organopolymeric material Photo and radiation-sensitive organopolymeric material

1984-06-22

1985-10-01

Brammer, Jack P.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

20415913, 528 35, 430270, 430272, 430311, C08G 7704

Patent

active

045447292

ABSTRACT:
A photo and radiation sensitive-organopolymeric material having at least one Si--Si).sub.n bond, wherein n is an integer of from 1 to 5 has a good resistance to dry etching, a good adhesion and a good heat resistance and is useful for finer patterning with a good resolution.

REFERENCES:
patent: 2696480 (1954-12-01), Gordon et al.
patent: 4339562 (1982-07-01), Guselnikov
patent: 4358576 (1982-11-01), Yajima et al.
patent: 4377677 (1983-03-01), Iwai et al.
patent: 4481279 (1984-11-01), Naito et al.

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