Phosphorus removal from surface regions of phosphosilicate glass

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...

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134 30, 427344, 427353, B05D 304

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active

042604257

ABSTRACT:
A method for reducing the phosphorus concentration in exposed surface areas of a phosphosilicate glass microcircuit layer to reduce the corrosivity of the layer. The method comprises a two step treatment of the layer surface: first, exposing the surface to water vapor at an elevated temperature for a time sufficient to hydrate available phosphorus in a region adjoining the surface, and second, removing the resultant acidic hydration products by rinsing the surface with water.

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patent: 3940511 (1976-02-01), Deal et al.
patent: 4010042 (1977-03-01), Boyer
patent: 4023951 (1977-05-01), Shaw et al.
patent: 4079522 (1978-03-01), Ham
patent: 4105427 (1978-08-01), Elmer
patent: 4139660 (1979-02-01), Tur

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