Phosphorus-nitrogen-oxygen composition and method for making suc

Details Phosphorus-nitrogen-oxygen composition and method for making suc Phosphorus-nitrogen-oxygen composition and method for making suc

1979-05-25

1981-06-23

James, Andrew J.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

357 52, 357 73, 427 85, 427 82, H01L 2940, H01L 2934, H01L 2330

Patent

active

042754097

ABSTRACT:
A composition is described which comprises amorphous phosphorus-nitrogen-oxygen material having excellent thermal stability and low reactivity to a wide variety of chemicals. The material is manufactured using a chemical vapor deposition process. The reaction chamber is maintained at a temperature between about 400.degree.-900.degree. C. with a suitable substrate placed therein. Reaction gases containing phosphorus-nitrogen-bearing compounds and a source of oxygen are passed through the chamber to deposit the phosphorus-nitrogen-oxygen film onto the substrate.

REFERENCES:
patent: 3584264 (1971-06-01), McLouski
patent: 3833919 (1974-09-01), Naber
patent: 3883889 (1975-05-01), Hall
patent: 4001872 (1977-01-01), Khajezadeh
patent: 4091407 (1978-05-01), Williams et al.
patent: 4172158 (1979-10-01), Li

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