Phosphorus-doped diamond film allowing significantly reduced...

Electric lamp or space discharge component or device manufacturi – Process – Electrode making

Reexamination Certificate

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C313S309000, C313S336000, C313S351000, C313S34600R, C445S024000, C445S046000

Reexamination Certificate

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08075359

ABSTRACT:
A phosphorus-doped diamond film, which contains phosphorus at a concentration of 1015cm−3or more, has a resistivity of 107Ωcm or less, and allows the voltage for initiation of electron emission to be 30V or less. A method for producing the phosphorus-doped diamond film by growing a diamond film on a diamond substrate by chemical vapor deposition method in an atmosphere containing methane and hydrogen gases and phosphorus with the use of tertiary butyl phosphorus as a source of addition of phosphorus. A diamond electron source having an electrode and a substrate which contains the phosphorous-doped diamond film and emitting electron beams from the phosphorous-doped diamond film when voltage is applied between the electrode and the substrate.

REFERENCES:
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patent: 2004 079910 (2004-09-01), None
patent: 2004 088703 (2004-10-01), None

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