Phosphorus diffusion process for semiconductors

Details Phosphorus diffusion process for semiconductors Phosphorus diffusion process for semiconductors

1978-11-13

1980-06-03

Williams, Howard S.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

148187, 148188, 427 85, H01L 21225, C23C 1500

Patent

active

042060265

ABSTRACT:
A process for manufacturing Phosphorus-doped surface layers in semiconductor substrates. The surface of the substrate is wetted with hot phosphoric acid and then coated prior to diffusion with a layer of material which is stable at the diffusion temperature.

REFERENCES:
patent: 2873221 (1959-02-01), Nijland et al.
patent: 3279963 (1966-10-01), Castrucci et al.
patent: 3391035 (1968-07-01), Mackintosh
patent: 3486951 (1969-12-01), Norby
patent: 3725149 (1973-04-01), Ilegems
patent: 3789023 (1974-01-01), Ritchie
patent: 3852086 (1974-12-01), Murata

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