Phosphor coating method for fabricating light emitting...

Details Phosphor coating method for fabricating light emitting... Phosphor coating method for fabricating light emitting...

2011-03-22

2011-03-22

Geyer, Scott B (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Packaging or treatment of packaged semiconductor

C438S110000, C257S099000

Reexamination Certificate

active

07910387

ABSTRACT:
A phosphor coating method for fabricating a light-emitting semiconductor is provided. The phosphor coating method comprises the steps as follows: First a light emitting semiconductor wafer having a plurality of die units formed thereon is provided, and a photoresist is then formed on the light emitting semiconductor wafer to cover the die units. A pattern process is conducted to form a plurality of openings associated with the die units, whereby each die can be exposed via one of the openings. Subsequently, a compound mixed with phosphor is filled into the openings.

REFERENCES:
patent: 7675075 (2010-03-01), Nagai
patent: 2007/0045761 (2007-03-01), Basin et al.
patent: 2000208822 (2000-07-01), None

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