Phosphonate hole blocking layer photoconductors

Details Phosphonate hole blocking layer photoconductors Phosphonate hole blocking layer photoconductors

2008-05-30

2011-11-22

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

C430S060000, C430S064000

Reexamination Certificate

active

08062816

ABSTRACT:
A photoconductor that includes, for example, a substrate; a first layer like a ground plane layer; an undercoat layer thereover wherein the undercoat layer contains an aminosilane and a phosphonate; a photogenerating layer; and at least one charge transport layer.

REFERENCES:
patent: 4265990 (1981-05-01), Stolka et al.
patent: 4464450 (1984-08-01), Teuscher
patent: 4921769 (1990-05-01), Yuh et al.
patent: 5114818 (1992-05-01), Yu
patent: 5385796 (1995-01-01), Spiewak et al.
patent: 5449573 (1995-09-01), Aoki et al.
patent: 5906904 (1999-05-01), Parikh et al.
patent: 5928824 (1999-07-01), Obinata et al.
patent: 6015645 (2000-01-01), Murti et al.
patent: 6156468 (2000-12-01), Wehelie et al.
patent: 6177219 (2001-01-01), Yuh et al.
patent: 6255027 (2001-07-01), Wehelie et al.
patent: 6913863 (2005-07-01), Wu et al.
patent: 7312007 (2007-12-01), Lin et al.
patent: 2004/0115547 (2004-06-01), Tong et al.
patent: 2005/0058919 (2005-03-01), Tong et al.
patent: 2005/0136349 (2005-06-01), Mishra et al.
patent: 2007/0026328 (2007-02-01), Wu et al.
patent: 2007/0026330 (2007-02-01), Wu et al.
patent: 2007/0049677 (2007-03-01), Wu et al.
patent: 2007/0243476 (2007-10-01), Lin et al.
patent: 2008/0008947 (2008-01-01), Wu
patent: 2008/0032219 (2008-02-01), Lin et al.
patent: 2009/0325091 (2009-12-01), Wu et al.
Jin Wu, U.S. Appl. No. 12/129,958 on Anthracene Containing Photoconductors, filed concurrently herewith.
Jin Wu, U.S. Appl. No. 12/129,965 on Ferrocene Containing Photoconductors, filed concurrently herewith.
Jin Wu, U.S. Appl. No. 12/129,969 on Amine Phosphate Containing Photogenerating Layer Photoconductors, filed concurrently herewith.
Jin Wu, U.S. Appl. No. 12/129,943 on Phenol Polysulfide Containing Photogenerating Layer Photoconductors, filed concurrently herewith.
Jin Wu, U.S. Appl. No. 12/129,948 on Aminosilane and a Self Crosslinking Acrylic Resin Hole Blocking Layer Photoconductors, filed concurrently herewith.
Jin Wu, U.S. Appl. No. 12/129,982 on Zirconocene Containing Photoconductors, filed concurrently herewith.
Jin Wu et al., U.S. Appl. No. 12/129,952 on Backing Layer Containing Photoconductor, filed concurrently herewith.
Jin Wu, U.S. Appl. No. 12/129,989 on Polymer Anticurl Backside Coating (ACBC) Photoconductors, filed concurrently herewith.
Jin Wu, U.S. Appl. No. 12/129,995 on Polyimide Intermediate Transfer Components, filed concurrently herewith.
Jin Wu, U.S. Appl. No. 12/059,536 on Carbazole Hole Blocking Layer Photoconductors, filed Mar. 31, 2008.
Jin Wu, U.S. Appl. No. 11/831,440 on Iron Containing Hole Blocking Layer Containing Photoconductors, filed Jul. 31, 2007.
Jin Wu, U.S. Appl. No. 11/831,453 on UV Absorbing Hole Blocking Layer Containing Photoconductors, filed Jul. 31, 2007.
Jin Wu, U.S. Appl. No. 11/831,476 on Indonium Hole Blocking Layer Photoconductors, filed Jul. 31, 2007.
Jin Wu, U.S. Appl. No. 11/831,469 on Copper Containing Hole blocking Layer Photoconductors, filed Jul. 31, 2007.
Jin Wu et al., U.S. Appl. No. 11/764,489 on Hole Blocking Layer Containing Photoconductors, filed Jun. 18, 2007.
Jin Wu et al., U.S. Appl. No. 11/714,600 on Hole Blocking Layer Containing Photoconductors, filed Mar. 6, 2007.

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