Phospho-boro-silanol interlayer dielectric films and preparation

Details Phospho-boro-silanol interlayer dielectric films and preparation Phospho-boro-silanol interlayer dielectric films and preparation

1985-05-14

1987-05-05

Marquis, Melvyn I.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

427387, 428447, 252511, 252518, 525474, C08G 7722

Patent

active

046634142

ABSTRACT:
There are disclosed certain categories of novel spin-coating compositions comprising phosphorus-doped and/or boron-doped silsesquioxane oligomers. Cured interlayer dielectric films prepared therefrom have a superior combination of defined properties, particularly including adhesion (of single-coat and multiple coats) and/or resistance against degradation at temperatures above 500.degree. C. The spin-coating compositions are prepared in a critical manner from critical raw materials.

REFERENCES:
patent: 3825442 (1974-07-01), Moore
patent: 4218571 (1980-08-01), Mitchell et al.
patent: 4552688 (1985-11-01), Sakamoto et al.
Journal of the Electrical Society, vol. 132, No. 3, Mar. 1985, p. 109C.
Cheng et al., Spin-On BPSG and Its Application to VLSI, AT and T Teletype Corp. Skokie, Ill. 6 page report.
Wacker Silicone Intermediate S4430, Munich, Oct. 1982.

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