Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Reexamination Certificate
2006-08-01
2009-11-24
Goodrow, John L (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
C430S059400, C430S060000
Reexamination Certificate
active
07622230
ABSTRACT:
A photoconductor containing a substrate, an undercoat layer thereover wherein the undercoat layer includes, for example, a polyol resin, an aminoplast resin, a polymeric phosphate ester adhesion component, and a metal oxide; and at least one imaging layer, such as a photogenerating and charge transport layer, formed on the undercoat layer.
REFERENCES:
patent: 4265990 (1981-05-01), Stolka et al.
patent: 4464450 (1984-08-01), Teuscher
patent: 4921769 (1990-05-01), Yuh et al.
patent: 5385796 (1995-01-01), Spiewak et al.
patent: 5449573 (1995-09-01), Aoki et al.
patent: 5473064 (1995-12-01), Mayo et al.
patent: 5595847 (1997-01-01), Nogami et al.
patent: 5928824 (1999-07-01), Obinata et al.
patent: 6015645 (2000-01-01), Murti et al.
patent: 6156468 (2000-12-01), Wehelie et al.
patent: 6177219 (2001-01-01), Yuh et al.
patent: 6180309 (2001-01-01), Maty et al.
patent: 6200716 (2001-03-01), Fuller et al.
patent: 6207334 (2001-03-01), Dinh et al.
patent: 6255027 (2001-07-01), Wehelie et al.
patent: 6287737 (2001-09-01), Ong et al.
patent: 6913863 (2005-07-01), Wu et al.
patent: 2003/0232265 (2003-12-01), Yamanami et al.
patent: 2004/0071884 (2004-04-01), Newton
patent: 2006/0047085 (2006-03-01), Trivedi
patent: 2006/0057480 (2006-03-01), Wu et al.
patent: 2007/0049677 (2007-03-01), Wu et al.
Jin Wu et al., U.S. Appl. No. 11/211,757 on Novel Thick Undercoats, filed Aug. 26, 2005.
Liang-Bih Lin et al., U.S. Appl. No. 11/403,981 on Improved Imaging Member, filed Apr. 13, 2006.
Jin Wu et al., U.S. Appl. No. 11/410,593 on Imaging Member Having Styrene, filed Apr. 25, 2006.
Levy Daniel V.
Lin Liang-Bih
Lopez Francisco J.
Wu Jin
Goodrow John L
Palazzo E. O.
Xerox Corporation
LandOfFree
Phosphate ester containing photoconductors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Phosphate ester containing photoconductors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phosphate ester containing photoconductors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4135369