Phenylenediamine derivative and photosensitive material using sa

Details Phenylenediamine derivative and photosensitive material using sa Phenylenediamine derivative and photosensitive material using sa

1992-03-24

1993-05-25

Martin, Roland

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 83, 564305, G03G 5047, G03G 509, C07C21100

Patent

active

052139263

ABSTRACT:
The present invention provides a phenylenediamine derivative of the following general formula (1). This derivative is excellent in photostability. Accordingly, when this derivative is contained in a photosensitive layer as an electric charge transferring material, there may be obtained an electrophotosensitive material excellent in photostability. ##STR1## [wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are the same as or different from one another.
Each of A.sup.1 and A.sup.2 is a hydrogen atom or the following group: ##STR2## (wherein R.sup.6 and R.sup.7 are the same as or different from each other, and each is a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group or a heterocyclic group; the alkyl group, the alkoxy group, the aryl group, the aralkyl group and the heterocyclic group may have respective substituting groups; n is 0 or 1. A.sup.1 and A.sup.2 are not hydrogen atoms simultaneously. R.sup.6 and R.sup.7 are not hydrogen atoms simultaneously.)]

REFERENCES:
patent: 3211793 (1965-10-01), Roos
patent: 4150987 (1979-04-01), Anderson et al.
patent: 5004662 (1991-04-01), Mutoh et al.
patent: 5059503 (1991-10-01), Muto et al.
patent: 5087544 (1992-02-01), Muto et al.

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