Phenyl alkyl ketone substituted by cyclic amine and a process fo

Details Phenyl alkyl ketone substituted by cyclic amine and a process fo Phenyl alkyl ketone substituted by cyclic amine and a process fo

1997-04-21

1998-08-18

Dees, Jose G.

Organic compounds -- part of the class 532-570 series

Organic compounds

Chalcogen in the nitrogen containing substituent

564336, 564342, 564343, 568306, C07D295116, C07C22100, C07C22516, C07C22522

Patent

active

057959854

ABSTRACT:
A novel process for the preparation of compounds of formula I ##STR1## by aminolysis of a p-halophenyl alkyl ketone of formula II ##STR2## with a cyclic amine of formula III ##STR3## in water at a temperature of at least 130.degree. C., in which formulae X is a halogen atom and R.sub.1, R.sub.2 and R.sub.3 are as claimed in claim 1, as well as the novel compounds of formula I and their use for the preparation of photoinitiators for the photopolymerisation of ethylenically unsaturated compounds.

REFERENCES:
patent: 1946058 (1934-02-01), Britton et al.
patent: 2205728 (1940-06-01), Martin et al.
patent: 3317538 (1967-05-01), Freed et al.
patent: 4992547 (1991-02-01), Berner et al.
patent: 5077402 (1991-12-01), Desobry et al.
Bull. Chem. Soc. Jpn., 64, 42-49 (1991) vol. 64, No. 1.
J. Org. Chem. 31 (7), (1966), pp. 2319-2321.
Chem. Berichte 90, 2161, 2174, (1957).
Acta. Chem. Scand. B38, No. 8, pp. 717-719, (1984).
Derwent Abst. 85084B/47 (1979).
Chem. Abst. 92(19): 163712X (1978).
Chemical Abstracts, vol. 108, No. 10, 85724 K (1988).
Chem. Pharm. Bull. vol. 41, No. 3. 1993, pp. 529-538.

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