Phenolic-free stripping composition and use thereof

Compositions – Compositions containing a single chemical reactant or plural... – Organic reactant

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Details

252162, 252170, 252547, 252558, 252DIG8, 134 38, C11D 750, C11D 112

Patent

active

049717154

ABSTRACT:
A stripping composition containing O-dichlorobenzene, dodecylbenzene sulfonic acid, perchloroethylene, and optionally an aromatic hydrocarbon containing at least 8 carbon atoms, and use thereof for removing photoresist.

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