Phenol novolak resin, production process thereof, and...

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

Reexamination Certificate

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C525S492000, C528S155000, C430S191000, C430S192000, C430S193000

Reexamination Certificate

active

06939926

ABSTRACT:
A phenol novolak resin has a peak intensity ratio of ortho-ortho bond (o-o)/ortho-para bond (o-p)/para-para bond (p-p) in a resin structure not substantially varying in each molecular weight fraction and has a weight average molecular weight (Mw) of 3000 to 20000 in terms of polystyrene, which peak intensity ratio is detected by13C-NMR analysis. The phenol novolak resin can form both dense pattern and isolation pattern with good shapes in the formation of a fine resist pattern of not more than 0.35 μm and has satisfactory sensitivity, definition, and focal depth range properties, and has a resin composition being uniform in each molecular weight fraction. A process for producing the phenol novolak resin, and a positive photoresist composition using the resin are also provided.

REFERENCES:
patent: 4837121 (1989-06-01), Blakeney et al.
patent: 5130410 (1992-07-01), Zampini
patent: 5196289 (1993-03-01), Jeffries, III et al.
patent: 5234795 (1993-08-01), Jeffries, III et al.
patent: 5413894 (1995-05-01), Sizensky et al.
patent: 5604077 (1997-02-01), Kono et al.
patent: 6642345 (2003-11-01), Yuasa et al.

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