Phenol-free photoresist stripper

Details Phenol-free photoresist stripper Phenol-free photoresist stripper

1976-11-08

1980-12-30

Pitlick, Harris A.

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

134 3, 134 38, 134 40, 134 42, 252162, 252171, 252558, C23G 502, G03C 1112

Patent

active

042422183

ABSTRACT:
Stripping solutions, free from phenol compounds, comprising at least 30 weight percent of an unsubstituted or alkyl substituted aryl sulfonic acid have been found effective for removal of organic polymeric substances from inorganic substrates. The novel compositions comprise 30-80 percent of one or more of the sulfonic acids in admixture with chlorinated aryl compounds, alkylaryl compounds having 1-14 alkyl carbons, an isoparaffinic hydrocarbon, or mixtures thereof.

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patent: 3357828 (1967-12-01), Moe
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patent: 3871929 (1975-03-01), Schevey et al.
patent: 3925231 (1975-12-01), Ritzi
patent: 3929680 (1975-12-01), Arai et al.
patent: 3988256 (1976-10-01), Vander Mey et al.
patent: 4070203 (1978-01-01), Neisius et al.

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