Phenol-free and chlorinated hydrocarbon-free photoresist strippe

Details Phenol-free and chlorinated hydrocarbon-free photoresist strippe Phenol-free and chlorinated hydrocarbon-free photoresist strippe

1978-05-22

1979-08-21

Pitlick, Harris A.

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

134 3, 134 38, 134 42, 252171, 252558, C11D 343, B08B 308, C23G 502

Patent

active

041652940

ABSTRACT:
Stripping solutions, free from phenol and chlorinated hydrocarbon compounds, comprising a surfactant alkylarylsulfonic acid having 12-20 carbons, a hydrotropic aromatic sulfonic acid having 6-9 carbons and a halogen-free aromatic hydrocarbon solvent with a boiling point above 150.degree. C. The stripping compositions effectively remove organic polymeric substances from inorganic substrates and are substantially clear water rinsable.

REFERENCES:
patent: 2814593 (1957-11-01), Beiswanger et al.
patent: 3335088 (1967-08-01), Mandell
patent: 3582401 (1971-06-01), Berilla et al.
patent: 3600321 (1971-08-01), Tedeschi et al.
patent: 3871929 (1975-03-01), Schevey et al.
patent: 3932130 (1976-01-01), Bennett et al.
patent: 3988256 (1976-10-01), Vander Mey et al.
patent: 4070203 (1978-01-01), Neisius et al.

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