Phase-shifting transparent lithographic mask for writing contigu

Details Phase-shifting transparent lithographic mask for writing contigu Phase-shifting transparent lithographic mask for writing contigu

1993-04-02

1994-11-08

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430322, G03F 900

Patent

active

053625846

ABSTRACT:
A plurality of noncontiguous polygonal regions of phase-shifting material have edges spaced apart less than the distance at which images of said edges would separate. The edges of the regions of phase-shifting material have differing arbitrarily selectable angular orientations (nonparallel as well as parallel) on a nonphase-shifting material. The noncontiguous phase-shifting regions may be arranged in a matrix of parallel columns and rows to facilitate fabrication and facilitate writing of the phase-shifting regions in any arbitrary pattern on an image plane. At least one of the phase-shifting regions constitutes a connective phase-shifting region with edges spaced from edges of adjacent ones of the phase-shifting regions to create a pattern with a continuous body of photoresist covering areas corresponding to the phase-shifting regions upon exposure of the mask. The phase-shifting regions may have different transmission coefficients to provide differing degrees of transparency or different degrees of phase shift to provide differing degrees of image intensity.

REFERENCES:
patent: 4360586 (1982-11-01), Flanders et al.
patent: 4631416 (1986-12-01), Trutna, Jr.
patent: 4859548 (1989-08-01), Heise et al.
patent: 4885231 (1989-12-01), Chan
patent: 4902899 (1990-02-01), Lin et al.
patent: 5273850 (1993-12-01), Lee et al.
Dainty et al., "Image Science, Principles, Analysis and Evaluation of Photographic-Type Imaging Processes", Academic Press, 1974.
Levenson et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Devices, vol. Ed-29, No. 12, Dec. 1982.
Schellenberg et al., "Optimization of Real Phase Mask Performance", SPIE vol. 1604 11th Annual BACUS Symposium on Photomask Technology (1991).
Watanabe et al., "Sub-Quarter-Micron Gate Pattern Fabrication using a Tranparent Phase Shifting Mask", J. Vac. Sci. Technol. B 9(6), Nov./Dec. 1991.
Toh et al., "Chromless Phase-Shifted Masks: A New Approach to Phase-Shifting Masks", A Preprint from the Tenth Annual Symposium on Microlithography of BACUS, Sep. 1990.
Watanabe et al., "Pattern Tranfer Characteristics of Transparent Phase Shifting Mask", Japanese Journal of Applied Physics, vol. 30, No. 11B, Nov. 1991, pp. 3004-3009.
Watanabe et al., "Transparent Phase Shifting Mask", International Electron Devices Meeting, Dec. 9-12, 1990.
Brock et al., "Fabrication of Grooved Glass Substrates by Phase Mask Lithography", Reproduced from Research Disclosure, Jan. 1991, No. 321, Kenneth Mason Publications Ltd., England.

Affiliated with

Also associated with

Rating

Phase-shifting transparent lithographic mask for writing contigu does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Phase-shifting transparent lithographic mask for writing contigu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phase-shifting transparent lithographic mask for writing contigu will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1781260