Phase-shifting point diffraction interferometer focus-aid enhanc

Details Phase-shifting point diffraction interferometer focus-aid enhanc Phase-shifting point diffraction interferometer focus-aid enhanc

1999-07-26

2000-11-21

Kim, Robert H.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356359, G01B 902

Patent

active

061511153

ABSTRACT:
A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.

REFERENCES:
patent: 5835217 (1998-11-01), Medecki
Naulleau, Patrick, et al. "Characterization of the accuracy of EUV phase-shifting point diffraction interferometry", SPIE, V. 3331 (1998) 114-123.
Anderson, Erik H., et al., "Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures", J. Vac. Sci. Technol.B, vol. 13, No. 6, (1995) 2529-2534.
Brophy, Chris P., "Effect of intensity error correlation on the computed phase of phase-shifting interferometry", J. Opt. Soc. Am. A, vol. 7, No. 4 (1990) 537-541.
Medecki, H., et al., "Phase-shifting point diffraction interferometer" Optics Letters, vol. 21, No. 19 (1996) 1526-1528.

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