Phase shifting overlay mark that measures exposure energy and fo

Details Phase shifting overlay mark that measures exposure energy and fo Phase shifting overlay mark that measures exposure energy and fo

1996-12-27

1998-06-23

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

257797, 356399, 438975, G03F 900

Patent

active

057703388

ABSTRACT:
An overlay mark for detecting focus and exposure energy during an alignment process for forming a pattern of a semiconductor device is disclosed. The overlay mark includes an inner box and an outer box to concurrently measure exposure energy and focus, wherein, the changes of the exposure energy and the focus are respectively represented by phase shift between the inner and outer boxes in X-axis and Y-axis, the X-axis and the Y-axis representing phase shift respectively to indicate the exposure energy and the focus.

REFERENCES:
patent: 5498500 (1996-03-01), Bae
patent: 5538819 (1996-07-01), De Marco et al.
patent: 5633103 (1997-05-01), De Marco et al.

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