Phase-shifting mask structure

Details Phase-shifting mask structure Phase-shifting mask structure

1997-11-26

1999-08-03

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, G03F 900

Patent

active

059323760

ABSTRACT:
A phase-shifting mask structure has a base plate, a pattern zone on the base plate and a peripheral region on the periphery of the base plate around the pattern zone. The peripheral region and the pattern zone further have a plurality of alignment-checking patterns and alignment slits. Each alignment-checking pattern has a first pattern of light-blocking thin films and a second pattern of light-penetrating thin films. Similarly, each alignment slit has a third pattern of light-blocking thin films and a fourth pattern of light-penetrating thin films. In this invention, absolute light-blocking thin films are used in the light-blocking portions of the alignment-checking pattern and the alignment slits instead of the semi-transparent thin films in a conventional system. Thus, alignment checking errors due to the distortion of fiducial marks are minimized, and mask layers are more precisely aligned.

REFERENCES:
patent: 5674650 (1997-10-01), Dirksen et al.
patent: 5733690 (1998-03-01), Jeong et al.
patent: 5770338 (1998-06-01), Lim et al.

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