Phase shifting mask having a phase shift that minimizes critical

Details Phase shifting mask having a phase shift that minimizes critical Phase shifting mask having a phase shift that minimizes critical

1996-12-31

1998-11-24

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058404481

ABSTRACT:
A reticle having only one phase delay value for a given wavelength of incident radiation. The reticle includes a first and second region, both transparent to incident radiation. The second region being adjacent to said first region. The incident radiation transmitted by the second region has a phase delay of other than an integer multiple of 90 degrees relative to said incident radiation transmitted by the first region.

REFERENCES:
patent: 5229255 (1993-07-01), White
patent: 5308722 (1994-05-01), Nistler
patent: 5543254 (1996-08-01), Kim et al.

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