Phase shifting mask and method of manufacturing the same

Details Phase shifting mask and method of manufacturing the same Phase shifting mask and method of manufacturing the same

1997-05-22

1999-02-16

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058718699

ABSTRACT:
A method of manufacturing a phase shifting mask includes the steps of forming a phase shifting layer on a transparent substrate; forming an anti-deposition layer on the phase shifting layer; patterning the phase shifting layer and the anti-deposition layer; wet-etching the anti-deposition layer to expose a portion of the phase shifting layer; selectively forming a light shielding layer on the exposed portion of the phase shifting layer; and removing the anti-deposition layer.

REFERENCES:
patent: 5429896 (1995-07-01), Hasegawa et al.
patent: 5489509 (1996-02-01), Kawabata et al.
patent: 5556724 (1996-09-01), Tarumoto
patent: 5656397 (1997-08-01), Imai
Marc D. Levension et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Devices, vol. Ed-29, No. 12, Dec. 1982, pp. 1828-1836.

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