Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-03-31
1995-08-01
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430322, 430323, 430324, G03F 900
Patent
active
054379474
ABSTRACT:
An edge enhancement phase shifting mask having a recessed opaque layer which optimally exhibits the phase shifting effect at edge portion is disclosed, wherein the mask comprises a transparent substrate having at least one or more trenches spaced apart from each other by a predetermined distance, an opaque layer filling some portion of the trench, and a phase shifting layer formed on the substrate area between the trenches. And the method of manufacturing such a mask comprises the steps of forming a first photoresist pattern by etching the coated photoresist film on a transparent substrate, forming at least one or more trenches by etching the transparent substrate masked with the patterned photoresist layer, forming a opaque layer occupying some portion of the trench through etch back process applying to a deposited metal layer on the whole surface of the substrate, forming a phase shifting layer over the surface of the non-etched transparent substrate and exposing a substrate area between the phase shifting layer and the opaque layer.
REFERENCES:
patent: 3604778 (1971-09-01), Burckhardt
patent: 4068260 (1978-01-01), Ohneda et al.
patent: 4360586 (1982-11-01), Flanders et al.
patent: 4774164 (1988-09-01), Peavey et al.
patent: 4782035 (1988-11-01), Fujiwara
patent: 4985319 (1991-01-01), Watakabe et al.
patent: 5153083 (1992-10-01), Garofalo et al.
patent: 5187726 (1993-02-01), White
patent: 5246799 (1993-09-01), Pierrat
patent: 5300379 (1994-04-01), Dao et al.
Paper Entitled "Fabrication of 64M DRAM with I-Line Phase-Shift Lithography" by K. Nakagawa, et al. Published in the Technical Digest of the International Electron Devices Society of IEEE Dec. 9-12, 1990.
Paper Entitled "Spatial Filtering for Depth of Focus and Resolution Enhancement in Optical Lithography" by H. Fukuda, et al., Published in J. Vac. Sci. Technol. Nov./Dec. 1991.
Hur Hun
Lee Jun S.
Goldstar Electron Co. Ltd.
Rosasco S.
LandOfFree
Phase shifting mask and method of manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Phase shifting mask and method of manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phase shifting mask and method of manufacturing the same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-733192