Phase-shifting mask and method for manufacturing the same

Details Phase-shifting mask and method for manufacturing the same Phase-shifting mask and method for manufacturing the same

1997-06-19

1999-03-16

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430323, G03F 900

Patent

active

058828249

ABSTRACT:
Phase-shifting mask which minimizes thickness and phase variations of a phase-shifting layer, and the method for manufacturing the same, the phase-shifting mask including a transparent substrate, a plurality of light-shielding layers formed in the transparent substrate; and a plurality of phase-shifting layers each formed on the transparent substrate between the light-shielding layers; and the method including the steps of providing a transparent substrate, defining transparent regions and light-shielding regions so as to form a plurality of trenches, channels or recesses in each of the light-shielding regions of the transparent substrate, forming each of a plurality of light-shielding layers in each of the plurality of trenches, channels or recesses, and forming a phase-shifting layer on the transparent substrate at least between a pair of the light-shielding layers.

REFERENCES:
patent: 5437947 (1995-08-01), Hur et al.
patent: 5705300 (1995-10-01), Bae
A. Lmai, et al., "Microlithography World", Summer 1996, p. 10.

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