Phase shifting mask

Details Phase shifting mask Phase shifting mask

1991-12-24

1994-01-04

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430320, 430321, G03F 900

Patent

active

052758940

ABSTRACT:
A phase shifting mask includes an opaque layer having three adjacent apertures which comprise a predetermined pattern, and at least two phase shifters each having a different shift amount. At least two of the apertures are covered with the phase shifters so that a phase difference between each two adjacent apertures is approximately 120.degree. (1/3.lambda.). Therefore, light intensity at a medial area between each two adjacent aperture is decreased in comparison with independent lights passing through the apertures.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
Patent Abstracts of Japan, vol. 15, No. 391 (P-1259) Oct. 3, 1991.

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