Phase-shifting mask

Details Phase-shifting mask Phase-shifting mask

1992-05-29

1998-03-31

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

057336865

ABSTRACT:
A phase-shifting mask having a phase-shifting portion for shifting the phase of a transmission light on both of one surface and another surface of a transparent substrate. In a preferred embodiment, at least a portion of the phase-shifting portion on one surface overlaps with at least one portion of the phase-shifting portion on the other surface. The phase-shifting mask is applicable both to negative and positive type masks and can be formed easily with no problems, such as reduction of the transmittance and close contact.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto

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