Phase shift photomask, phase shift photomask blank, and process

Details Phase shift photomask, phase shift photomask blank, and process Phase shift photomask, phase shift photomask blank, and process

1995-05-30

1997-12-30

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430324, 428 78, 428433, G03F 900

Patent

active

057028478

ABSTRACT:
The invention relates to a phase shift photomask in which the peripheral region portion of a phase shift layer is removed by a relatively simple procedure and which has no or little defect and is inexpensive, a blank therefor, and a process for fabricating them. The process includes the steps of forming phase shift layer 23 all over the surface of one side of transparent substrate 21, and immersing only the peripheral region of substrate 21 in etching solution 25 to etch away the peripheral region of phase shift layer 23, whereby phase shift layer 27 is confined within an area smaller than that of substrate 21.

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