Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-05-15
2008-09-16
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07425393
ABSTRACT:
A phase shift photomask and method for improving printability of a structure on a wafer are disclosed. The method includes providing a photomask including a zero degree PSW formed on a top surface of a substrate and a 180 degree PSW formed in a first region of the substrate. An orthogonal PSW that facilitates projection of an increased intensity of radiant energy through a second region of the substrate during a lithography process is formed in the second region between the zero degree PSW and the 180 degree PSW.
REFERENCES:
patent: 5428478 (1995-06-01), Hanyu et al.
patent: 5573890 (1996-11-01), Spence
patent: 5620816 (1997-04-01), Dao
patent: 5807649 (1998-09-01), Liebmann et al.
patent: 5882827 (1999-03-01), Nakao
patent: 5935740 (1999-08-01), Pierrat
patent: 5958630 (1999-09-01), Hashimoto et al.
patent: 6042998 (2000-03-01), Brueck et al.
patent: 6057063 (2000-05-01), Liebmann et al.
patent: 6251549 (2001-06-01), Levenson
patent: 6841801 (2005-01-01), Kim et al.
patent: 2002/0058188 (2002-05-01), Iwasaki et al.
patent: 2002/0094492 (2002-07-01), Randall et al.
patent: 1400630 (2003-03-01), None
International Preliminary Report and Written Opinion; PCT/US2004/038900; pp. 6, mailed Jun. 1, 2006.
PCT Transmittal of International Search report and Written Opinion for PCT/US04/38900, 9 pgs, mailed Dec. 19, 2005.
Baker & Botts L.L.P.
Rosasco Stephen
Toppan Photomasks, Inc.
LandOfFree
Phase shift photomask and method for improving printability... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Phase shift photomask and method for improving printability..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phase shift photomask and method for improving printability... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3985194