Phase shift photomask

Details Phase shift photomask Phase shift photomask

1993-11-29

1995-02-07

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430396, G03F 900

Patent

active

053874854

ABSTRACT:
A phase shift photomask for forming a fine-line pattern with high dimensional accuracy even at different focus positions. The phase shift photomask has a transparent substrate (1) of quartz, for example, and a light-shielding film (2) of chromium, for example, provided on the substrate (1). The light-shielding film (2) is partially removed to form a first opening pattern (4a) and a second opening pattern (4b) with a very small width which is annularly provided in a peripheral region adjacent to the first opening pattern (4a). The light-shielding film (2c) is left in each of the four corners of the second opening pattern (4b). In addition, a phase shifter layer 3 is provided over either of the first or second opening patterns (4a, 4b).

REFERENCES:
patent: 5273850 (1993-12-01), Lee et al.

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