Phase shift optical mask and method of correcting defects in opt

Details Phase shift optical mask and method of correcting defects in opt Phase shift optical mask and method of correcting defects in opt

1995-03-23

1996-10-01

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430323, 430324, 430325, 216 12, 216 48, G03F 900

Patent

active

055610102

ABSTRACT:
A phase shift optical mask is adapted to receive exposure light and is provided with a transparent substrate, a phase shifter shifting a phase of the exposure light with respect to the phase of the exposure light transmitted through the transparent substrate, and a transparent layer interposed between the transparent substrate and the phase shifter. The transparent layer shifts the phase of the exposure light by 90.degree.+180.degree..multidot.n and n is an integer.

REFERENCES:
patent: 5246801 (1993-09-01), Pierrat
patent: 5272024 (1993-12-01), Lin

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