Phase shift mask, method of manufacturing phase shift mask and m

Details Phase shift mask, method of manufacturing phase shift mask and m Phase shift mask, method of manufacturing phase shift mask and m

1997-01-27

1999-03-16

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, G03F 900

Patent

active

058828273

ABSTRACT:
A phase shift mask has phase shift portions of both Levenson type and Halftone type. At the phase shift portion of Levenson type, formed are first and second light transmitting regions and transmitting exposure light of different phases, as well as a shading region constituted by a stacked structure of a semi-shading shifter film and a shading film. At the phase shift portion of Halftone type, a third light transmitting region where a surface of a quarts substrate is exposed, and a fourth light transmitting region having the semi-shading shifter film on the surface of the quartz substrate are provided. A phase shift mask, a method of manufacturing the phase shift mask and a method of forming a pattern using the phase shift mask can thus be obtained in which a highly precise alignment mark is unnecessary, a process for manufacturing is simple, and a defect can easily be removed.

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