Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-01-08
1998-04-28
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430322, G03F 900
Patent
active
057442681
ABSTRACT:
A surface of a transparent substrate is exposed at a first light transmission region Ta.sub.1, a semi-shield film is formed on the surface of the transparent substrate at a second light transmission region Ta.sub.2, a trench is formed at the surface of the transparent substrate at a third light transmission region Tn.sub.1, the semi-shield film and a phase shifter layer are layered on the surface of the transparent substrate at a fourth light transmission region Tn.sub.2, and the semi-shield film, the phase shifter layer and a shield film are layered on the surface of the transparent substrate at a shield region S. Thereby, hole patterns at a fine pitch can be precisely formed at a photoresist of a positive type by an exposure apparatus using a reduced number of a mask and having a simple structure.
REFERENCES:
patent: 5608775 (1997-03-01), Watanabe
patent: 5670281 (1997-09-01), Dai
Mitsubishi Denki & Kabushiki Kaisha
Rosasco S.
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