Phase shift mask having multiple alignment indications and metho

Details Phase shift mask having multiple alignment indications and metho Phase shift mask having multiple alignment indications and metho

1998-06-17

2000-03-28

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, G03F 900

Patent

active

060429720

ABSTRACT:
A phase shifting mask having an alignment region, a plurality of first transparent regions, and a plurality of transparent phase shifting regions. The mask includes a transparent substrate having an opaque material disposed on selected portions of a surface of the substrate. The opaque material disposed on a first portion of the surface of the substrate has a cross-shaped space therein to expose an underlying portion of the surface of the substrate. A first line of the cross-shaped space provides a first one of a pair of first alignment detection indicia for the alignment detection region. A second line of the cross-shaped space provides a second one of a pair of first alignment detection indicia for the alignment detection region. The opaque material disposed on each one of a pair of second portions of the surface of the substrate has a plurality of spaces therein. Each one of the spaces in the second regions exposes a underling portion of the surface of the substrate. The spaces in a first one of the second regions are parallel to the first line of the cross-shaped space and the spaces in a second one of the second regions are parallel to the second line of the cross-shaped space. A pair of the plurality of transparent phase shifting regions is provided, each one thereof in a first one of the pair thereof is disposed in a corresponding one of the spaces in the first one of the second region and each one thereof in a second one of the pair thereof is disposed in a corresponding one of the spaces in the second one of the second regions. The transparent phase shifting regions in the pair thereof provide a pair of second alignment direction indicia for the alignment detection region.

REFERENCES:
patent: 5477058 (1995-12-01), Sato
patent: 5478679 (1995-12-01), Loong et al.
patent: 5674650 (1997-10-01), Dirksen et al.
patent: 5756235 (1998-05-01), Kim
patent: 5792578 (1998-08-01), Tzu et al.
patent: 5863677 (1999-01-01), Nakao

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