Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1995-11-28
1999-04-27
Angebranndt, Martin
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430313, G03F 900
Patent
active
058979751
ABSTRACT:
A phase shift mask capable of forming contact holes having a micro dimension smaller than the wavelength of exposure light while being spaced at small intervals. The phase shift mask includes a quartz substrate, a chromium pattern formed on the quartz substrate along a peripheral edge of the quartz substrate, and a plurality of uniformly spaced phase shift layer patterns formed on a portion of the quartz substrate not covered with the chromium pattern, each of the phase shift layer patterns having a desired size. Each of the phase shift layer patterns has a line width larger than the wavelength of a light source used in a light exposure procedure.
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Ahn Chang Nam
Kim Hung Eil
Angebranndt Martin
Hyundai Electronics Industries Co,. Ltd.
Nath Gary M.
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