Phase shift mask comprising micro spaces in peripheral opaque re

Details Phase shift mask comprising micro spaces in peripheral opaque re Phase shift mask comprising micro spaces in peripheral opaque re

1995-06-21

1997-06-03

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, G03F 900

Patent

active

056353146

ABSTRACT:
The present invention relates to a phase shift mask for modifying blackout patterns at the peripheral sites of the mask, thereby capable of compensating the differences in the light intensity at the peripheral sites of the mask where the light intensity is relatively reduced after light has passed through the mask. The present invention enables the uniformity of critical dimension of the patterns in photoresist film, thus enhances the reliability and the yield of devices.

REFERENCES:
patent: 5318868 (1994-06-01), Hasegawa et al.
patent: 5380609 (1995-01-01), Fujita et al.
patent: 5409789 (1995-04-01), Ito

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