Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-02-20
2007-02-20
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
10606894
ABSTRACT:
In a phase shift mask blank comprising a transparent substrate and a phase shift film thereon, after the phase shift film is formed on the substrate, it is surface treated with ozone water having an ozone concentration of at least 1 ppm. The resulting phase shift film is of quality in that it experiences minimized changes of phase difference and transmittance upon immersion in chemical liquid during subsequent mask cleaning step or the like.
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Inazuki Yukio
Kaneko Hideo
Nakatsu Masayuki
Numanami Tsuneo
Okazaki Satoshi
Birch & Stewart Kolasch & Birch, LLP
Rosasco S.
Shin-Etsu Chemical Co. , Ltd.
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