Phase shift mask blank and method of manufacture

Details Phase shift mask blank and method of manufacture Phase shift mask blank and method of manufacture

2006-05-02

2006-05-02

Letscher, Geraldine (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07037625

ABSTRACT:
A phase shift mask blank is composed of a transparent substrate and a phase shift film thereon. The phase shift film is made of at least two types of layer stacked in alternation, each type having a different composition and containing at least one element selected from among metals, silicon, oxygen and nitrogen. The alternately layered film enables a high-quality phase shift mask blank having improved chemical resistance to be achieved.

REFERENCES:
patent: 5514499 (1996-05-01), Iwamatsu et al.
patent: 5605776 (1997-02-01), Isao et al.
patent: 5811208 (1998-09-01), Yokoyama et al.
patent: 5939227 (1999-08-01), Smith
patent: 6051345 (2000-04-01), Huang
patent: 6641958 (2003-11-01), Inazuki et al.
patent: 2002/0012855 (2002-01-01), Yan et al.
patent: 2002/0039690 (2002-04-01), Inazuki et al.
patent: 2002/0119378 (2002-08-01), Angelopoulos et al.
patent: 2004/0191646 (2004-09-01), Yoshikawa et al.
patent: 2004/0197679 (2004-10-01), Yoshikawa et al.
patent: 100 55 280 (2001-12-01), None
patent: 1 117 000 (2001-07-01), None
patent: 1 176 466 (2002-01-01), None
patent: 7-140635 (1995-06-01), None
patent: 2001201842 (2001-07-01), None

Affiliated with

Also associated with

Rating

Phase shift mask blank and method of manufacture does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Phase shift mask blank and method of manufacture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phase shift mask blank and method of manufacture will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3587844