Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-03-27
1999-08-24
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
428432, G03F 900
Patent
active
059423560
ABSTRACT:
A half tone type phase shift mask as well as a phase shift mask blank for the mask is formed with a thin film light translucent portion made of essentially, nitrogen, metal, and silicon. The containing rate of each element and ratio in the thin film is specified in a certain range to improve film characteristics, such as acid resistance, photo resistance, conductivity, refractive index rate (film thickness), light transmission rate, etching selectivity, etc. of the light translucent portion. The phase shift mask satisfies optical characteristics (i.e., light transmitting rate and phase shift amount) with high precision, as well as reduces defects in the thin film.
REFERENCES:
patent: 5804337 (1998-09-01), Mitsui et al.
Mitsui Masaru
Okada Kimihiro
Suda Hideki
Hoya Corporation
Manzo Edward D.
Murphy Mark J.
Rosasco S.
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