Phase shift mask and method of manufacturing the same

Details Phase shift mask and method of manufacturing the same Phase shift mask and method of manufacturing the same

1993-08-31

1995-03-14

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430323, G03F 900

Patent

active

053976630

ABSTRACT:
An exposure mask and an exposure method are provided, which can suppress adverse effects of interference edge patterns (sub-shifters) located around a central pattern.
The exposure mask has central patterns and edge patterns arranged around each central pattern. The mutual interference of edge patterns is reduced by providing an angle or a phase difference between vicinity edge patterns, or providing a single edge pattern to reduce the light transmission.

REFERENCES:
Ohtsuka et al (Conjugate Twin-Shifter Masks with Multiple Focal Planes).

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