Phase shift mask and method of manufacture

Details Phase shift mask and method of manufacture Phase shift mask and method of manufacture

1994-11-14

1998-03-17

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

057284911

ABSTRACT:
A phase shift mask and method of manufacture are disclosed in which a light shielding layer is formed on a substrate and patterned to produce parallel areas of predetermined intervals and spacings of the desired shape. A phase shift film is formed on the substrate and light shielding layer. The phase shift film is patterned so that remaining portions of the phase shift film fully shield the parallel areas of the light shielding layer.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5208125 (1993-05-01), Lowrey et al.
** Handbook of VLSI Microlithography . . . Edited by William B. Glendinning (Nobleboro, Maine) and John N. Helbert (Advanced Technology Center) Motorola, Inc., Mesa, Arizona pp. 352,353,354,355,356,357,364.
IEDM 90-821, Transparent Phase Shifting Mask -- by H. Watanabe, Y. Todokoro,and M. Inoue, Kyoto Research Laboratory, Matsushita Electronics Corporation 19, Nishikujo-Kasugacho, Minami-ku, Kyoto 601 Japan, pp. 33.2.1, 33.2.2, 33.2.3, 33.2.4.

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