Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-09-25
2010-12-07
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C430S394000
Reexamination Certificate
active
07846620
ABSTRACT:
The phase shift mask according to the present invention is a phase shift mask for manufacturing a semiconductor device. The phase shift mask includes a light-blocking portion, a light-transmitting portion, a phase shift portion, and an auxiliary pattern portion, the light-blocking portion, the light-transmitting portion, the phase shift portion, and the auxiliary pattern portion being concentrically arranged, wherein a width of the auxiliary pattern portion in a radius direction is less than a width of the light-transmitting portion and a width of the phase shift portion in a radius direction. Furthermore, it is possible that a phase of exposure light which passes through an auxiliary pattern portion is opposite to a phase of exposure light which passes through a light-transmitting portion or a phase shift portion, the light-transmitting portion or the phase shift portion being the closest to the auxiliary pattern portion.
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English language Abstract of JP 2006-351972.
English language Abstract of JP 2004-117689.
English language Abstract of JP 2001-196568.
Ishii Motonori
Matsuno Toshinobu
Onozawa Kazutoshi
Toshikiyo Kimiaki
Yogo Takanori
Alam Rashid
Greenblum & Bernstein P.L.C.
Huff Mark F
Panasonic Corporation
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