Phase-shift mask and method for making

Details Phase-shift mask and method for making Phase-shift mask and method for making

1991-08-19

1994-02-15

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430269, 430311, G03F 900

Patent

active

052865819

ABSTRACT:
A method is provided for fabricating a phase-shift mask (10, 30). A mask plate (11, 31) is provided. A semitransparent layer (12, 32) is deposited onto the mask plate (11,31). The semitransparent layer (12, 32) is then patterned into a predetermined geometric pattern. The patterning of the semitransparent layer (12, 32) is then continued into the mask plate (11, 31) for a predetermined distance (38), thus providing a phase-shift mask (10, 30).

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
Levinson et al, "Improving Resolution in Photolithography with a Phase-Shifting Mask" (IEEE vol. ED-29, No. 12, Dec. 1982).

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