Phase shift mask and method for forming phase shift mask

Details Phase shift mask and method for forming phase shift mask Phase shift mask and method for forming phase shift mask

1995-04-17

1997-01-07

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430314, 430322, 430323, G03F 900

Patent

active

055915507

ABSTRACT:
A halftone phase shift mask and a method for forming a halftone phase shift mask. The method includes: forming a halftone pattern material layer on a substrate; defining positions for forming more than one open region of a desired pattern and defining positions for forming one or more dummy open regions that can offset respective new side lobes having a high intensity formed by overlap of side lobes of light irradiated onto the substrate as well as the halftone material layer; and forming the patterned open regions and dummy open regions that can offset respective new side lobes at the defined positions on the halftone pattern material layer by subjecting the halftone pattern material layer to patterning.

REFERENCES:
patent: 5409789 (1995-04-01), Ito

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